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99.99995% Trimethylgallium 1445-79-0
99.99995% Trimethylgallium 1445-79-0

99.99995% Trimethylgallium 1445-79-0

Trimethylgallium, often abbreviated as TMG or TMGa, is an organogallium compound with the chemical formula Ga(CH3)3.  This compound is a colorless, pyrophoric liquid that exhibits a monomeric structure, in contrast to trimethylaluminium.       

                                                                                                                           

Trimethylgallium serves as a widely utilized metalorganic source of gallium in metalorganic vapor phase epitaxy (MOVPE), a process critical for the synthesis of gallium-containing compound semiconductors employed in the fabrication of optoelectronic devices and solar panels.

 


Trimethylgallium

Synonyms Trimethylgallane, Trimethanidogallium,Gallium, Trimethyl-EINECS 215-897-6
Cas No. 1445-79-0
Chemical formula Ga(CH3)3
Molar mass 114.827 g/mol
Appearance Colourless liquid
Melting point −15 ℃ (5 ℉; 258K)
Boiling point 55.7 ℃ (132.3 ℉; 328.8K)
Solubility in water Reacts with water

 

Trimethylgallium (TMG) is a clear, colorless, pyrophoric liquid that spontaneously ignites upon exposure to air. TMG is known to react violently with water and other compounds capable of donating labile or active hydrogen (i.e., protons).  

 

TMG must be handled with extreme care and caution. It should be stored in a cool, dry environment at temperatures ranging from 0 to 25 ℃ under an inert atmosphere. Storage temperatures must not exceed 40 ℃ to prevent deterioration.

 

Enterprise specification of 99.99995%Trimethylgallium - Low silicon content(6N5 TMGa-Low Si)

Element Result Specification Element Result Specification Element Result Specification
Ag ND <0.03 Co ND <0.02 Pb ND <0.03
Al ND <0.03 Cr ND <0.02 S ND <0.05
As ND <0.03 Cu ND <0.02 Sb ND <0.05
Au ND <0.02 Fe ND <0.04 Si ND <0.02
B ND <0.03 Ge ND <0.05 Sn ND <0.05
Ba ND <0.02 Hg ND <0.03 Sr ND <0.03
Be ND <0.02 La ND <0.02 Ti ND <0.05
Bi ND <0.03 Mg ND <0.02 V ND <0.03
Ca ND <0.03 Mn ND <0.03 Zn ND <0.03
Cd ND <0.02 Ni ND <0.03      

 

Note:

Above all value ppm by weight on metal,and ND=not detected

Analysis Method:ICP-MS

FT-NMR results(LOD for FT-NMR organic and oxygenated impurity is O.1ppm)

Oxygen guarantee <0.5ppm(measured in FT-NMR)

1.No Organic impurities detected

2.No Oxygenated impurities detected

 

What is Trimethylgallium used for?

Trimethylgallium (TMGa) - Applications and Uses

 

Trimethylgallium (TMGa), with the formula Ga(CH₃)₃, is an ultra-high-purity metalorganic compound that serves as the principal gallium source for advanced materials synthesis. Its exceptional volatility and decomposition characteristics make it the industry-standard precursor for the epitaxial growth of high-performance gallium-containing compound semiconductors, which are foundational to modern electronics, optoelectronics, and clean energy technologies.

 

Our TMGa is produced to the most stringent specifications, with meticulous control over metallic and organic impurities to ensure superior film quality and device performance.

 

Primary Applications and Industries:

 

1. Optoelectronics & Advanced Lighting

TMGa is the cornerstone precursor for manufacturing the active layers in a wide range of lighting and display technologies.

*   Light-Emitting Diodes (LEDs): Essential for the Metalorganic Vapor Phase Epitaxy (MOVPE) of:

    *   Gallium Nitride (GaN): The base material for high-efficiency blue, green, and white LEDs used in solid-state lighting, displays, and backlighting.

    *   Indium Gallium Nitride (InGaN): The key ternary compound that enables the tuning of LED emission wavelengths across the visible spectrum.

*   Laser Diodes: Used in the production of GaN-based laser diodes for applications ranging from high-density data storage (Blu-ray) to medical devices and projection systems.

 

2. Photovoltaics & Sustainable Energy

In the energy sector, TMGa enables the production of high-efficiency, next-generation solar cells.

*   Thin-Film Solar Cells: Serves as the gallium source for the synthesis of Copper Indium Gallium Selenide (CIGS) and related compounds, a leading thin-film photovoltaic technology known for its excellent efficiency and flexibility.

*   Wide-Bandgap Photovoltaics: Used in the development of emerging materials like gallium oxide (Ga₂O₃) for high-power, high-temperature solar applications.

 

3. Radio Frequency (RF) & High-Speed Electronics

The exceptional electronic properties of gallium-based semiconductors grown from TMGa are critical for communication and power management.

*   RF Amplifiers: Gallium Arsenide (GaAs) and Gallium Nitride (GaN) devices, fabricated using TMGa, are the backbone of radio frequency components in 5G infrastructure, satellite communications, and radar systems.

*   High-Electron-Mobility Transistors (HEMTs): GaN-based HEMTs grown with TMGa offer superior performance for high-power and high-frequency applications.

 

4. Microelectronics & Compound Semiconductors

TMGa is indispensable for the epitaxial growth of a broad portfolio of III-V compound semiconductors.

*   Precision Epitaxy: Used in MOVPE to grow high-quality thin films of materials such as Gallium Phosphide (GaP), Gallium Antimonide (GaSb), and complex multi-component alloys like Aluminum Gallium Indium Phosphide (AlGaInP) for specialized optoelectronic and electronic devices.

 

---

 

 Key Characteristics & Benefits:

 

*   Industry-Standard Precursor: The preferred and most trusted gallium source for MOVPE processes worldwide.

*   Ultra-High Purity: Rigorously purified to meet the exacting demands of electronic and optoelectronic grade manufacturing, ensuring high device yields and performance.

*   Superior Performance: Offers excellent volatility and predictable decomposition kinetics for the growth of high-crystallinity, uniform semiconductor films with precise compositional control.

*   Versatility: Enables the synthesis of a vast array of binary, ternary, and quaternary semiconductor compounds for diverse technological applications.

 

Disclaimer: Trimethylgallium is a pyrophoric and moisture-sensitive material that requires specialized handling and safety protocols. The information provided is for descriptive purposes. It is the user's responsibility to handle this material according to all applicable safety guidelines and to determine its suitability for a specific application.

 

 

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