Hafnium Tetrachloride(HfCl₄) 5N Semiconductor Grade

Hafnium tetrachloride (HfCl₄) is a colorless, crystalline solid with a molecular weight of 320.30 g/mol and CAS Registry Number 13499-05-3. It melts at 320 °C and undergoes sublimation at approximately 317 °C under ambient pressure. The compound is extremely hygroscopic and reacts exothermically and vigorously with moisture, necessitating storage under anhydrous, inert atmospheric conditions (e.g., argon or nitrogen) in tightly sealed containers. Due to its strong corrosivity, direct contact with skin or eyes may result in severe chemical burns. As a Class 8 corrosive hazardous substance (UN2509), handling requires appropriate personal protective equipment (PPE), including chemical-resistant gloves, goggles, and respiratory protection where dust generation is possible.  

Enterprise Standard of 5N Purity Grade Hafnium Tetrachloride

Comment: The above parameters were detected by ICP-MS.

What is Hafnium Tetrachloride used for?

Hafnium tetrachloride (HfCl₄) is a versatile inorganic compound that, owing to its unique chemical properties, finds extensive applications in numerous high-tech fields:

- Semiconductors and Electronic Materials: It serves as a key precursor for preparing high-dielectric-constant materials (such as hafnium dioxide), used in transistor gate insulating layers to significantly enhance chip performance. It is also widely employed in chemical vapor deposition (CVD) processes to deposit metallic hafnium or hafnium compound thin films, applied in high-performance transistors, memory devices, etc.

- Ultra-High Temperature Ceramics and Aerospace: Used in the manufacture of ultra-high temperature ceramic materials, which exhibit excellent high-temperature resistance, wear resistance, and corrosion resistance. These ceramics are suitable for extreme environments such as aircraft engine hot sections and rocket nozzles. Additionally, it can be used in high-power LED packaging materials to improve device heat dissipation and lifespan.

- Catalysis and Organic Synthesis: As an efficient Lewis acid catalyst, it promotes reactions such as olefin polymerization (e.g., as a precursor for Ziegler-Natta catalysts), esterification of alcohols and acids, acylation, and 1,3-dipolar cycloadditions, enhancing reaction rates and selectivity. It is also utilized in fine chemical synthesis of fragrances and pharmaceuticals.

- Nuclear Industry: Leveraging its good thermal and chemical stability, it is applied in nuclear reactor cooling systems and as coating materials for nuclear fuels, improving corrosion resistance and thermal stability.

- Energy Sector: Used as a raw material for synthesizing solid electrolyte materials like lithium hafnium phosphate for developing high ionic conductivity lithium batteries. It also serves as a precursor for high-capacity cathode materials in lithium and sodium-ion batteries.

- Zirconium-Hafnium Separation: Exploiting the difference in volatility between zirconium tetrachloride and hafnium tetrachloride, they can be efficiently separated via fractional distillation or gas chromatography. This is an important industrial method for obtaining pure hafnium.

In summary, hafnium tetrachloride plays an irreplaceable role in semiconductors, advanced materials, catalysis, nuclear energy, and new energy sectors, establishing itself as a core raw material in modern high-tech industries.